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Corgi Lithography & Semiconductor Photonics ETF

23.74

-0.8501-3.46%

成交量：32.94万

成交额：788.88万

市值：4.19亿

市盈率：- -

高：24.26

开：24.10

低：23.60

收：24.59

52周最高：32.00

52周最低：20.61

股本：1,767.00万

流通股本：1,767.00万

量比：1.74

换手率：1.86%

股息：- -

股息率：- -

净资产收益率：--

总资产收益率：--

市净率：--

市盈率(LYR):- -

数据加载中...

总览公司新闻资讯公告

财报前瞻 | 阿斯麦(ASML.US)AI溢价迎Q3财报大考 EUV订单与业绩指引或成股价胜负手

财报前瞻 | 阿斯麦(ASML.US)AI溢价迎Q3财报大考 EUV订单与业绩指引或成股价胜负手

ASML痛批欧洲半导体停滞！全球唯一EUV供应商在欧洲一台设备都没卖出去

ASML痛批欧洲半导体停滞！全球唯一EUV供应商在欧洲一台设备都没卖出去

半导体ETF指南：SMH、SOXX、DRAM、EUV、SOXL，谁才是2026年最值得关注的芯片赛道工具？

SK海力士目标2028年将High NA EUV技术用于DRAM内存量产

三星与ASML合作开发下一代EUV光刻掩模版

据首尔经济日报，三星电子将与全球最大的光刻设备制造商ASML共同开发高数值孔径（High-NA）极紫外（EUV）光刻技术

英特尔晶圆代工与阿斯麦深化合作，推动High-NA EUV用于更大尺寸AI芯片

TradingKey中文

瑞银：中国未来十年内难开发可媲美阿斯麦顶尖 EUV 光刻设备，DUV 量产或需两至五年

三星电子计划在1nm级制程节点实现High NA EUV商业应用

三星计划 2030 年 1 纳米工艺导入 High-NA EUV 技术

SK海力士据报推进EUV工艺引入新材料PSM

SK海力士正致力于推进其极紫外光刻（EUV）技术，以实现下一代DRAM的量产。公司于去年首次推出高数值孔径（High-N

消息称三星暂缓High-NA EUV技术量产，因财务考量而非技术瓶颈

24小时环球政经要闻 | 7月16日

这家初创公司一天内推出了35只ETF——而且没有放缓的打算

韩国简化极紫外光刻机进口审批流程

环球市场播报

韩国简化极紫外光刻机进口程序，以支持芯片产业发展

环球市场播报

英特格(ENTG)与JSR Corporation联合宣布就EUV光刻技术达成非独家交叉许可协议

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EUV设备用于大型AI和数据中心芯片制造。","market":"nz","thumbnail":"https://resource.tradingkey.com/cms_uploads/img/20240102/c0531811fe341e7a5268ef210c462723.jpg","type":0,"news_type":0,"thumbnails":["https://resource.tradingkey.com/cms_uploads/img/20240102/c0531811fe341e7a5268ef210c462723.jpg"],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.tradingkey.com/zh-hans/analysis/stocks/us-stock/262155438-intel-foundry-asml-deepen-collaboration-promote-high-na-euv-larger-ai-chips-tradingkey","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"corporation","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["TMYY","LEGR","QQQA","WISE","ALAI","UMCX","SOXM","AIFD","AIBU","TSEU","TSMX","GPTZ","BGIA","AVGC","AVGX","EUV","AMDC","INT","INTC","CNAV","SHOC","TSMU","LRNZ","TSEG","TSXU","XSEM","TTEQ","AIS","FTXL","AIVC","INTW","TSMG","AMUU","XNTK","TSMY","ARMH","GFSG","TWSC","AIQ","LINT","AMDG","FAI","SEMY","TSMZ","SMHC","SINTCmain","03191","AMDL","CHPX","EPAI"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2664860323","title":"瑞银：中国未来十年内难开发可媲美阿斯麦顶尖 EUV 光刻设备，DUV 量产或需两至五年","url":"https://stock-news.laohu8.com/highlight/detail?id=2664860323","media":"链捕手","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2664860323?lang=zh_cn&edition=fundamental","pubTime":"2026-09-02 09:16","pubTimestamp":1788311804,"startTime":"0","endTime":"0","summary":" ChainCatcher 消息，据彭博社报道，瑞银集团分析师预计，未来十年内中国半导体制造能力可能难以取得足够快的进展，从而开发出能够真正替代阿斯麦尖端 EUV 光刻技术的方案。瑞银分析师在报告中写道，“他们目前所处的阶段似乎与阿斯麦在 2004 年时相当”，从专利申请活动来看，尤其是在光源和激光子系统领域，中国当前技术成熟度大致相当于阿斯麦开始大规模生产 EUV 设备前 15 年的水平。\n\n瑞银同时预计，中国有望在未来两到五年内具备浸没式 DUV 光刻机的大规模量产能力。浸没式 DUV 虽不如 EUV 先进，但仍是芯片制造不可或缺的设备。阿斯麦浸没式 DUV 售价近 9000 万美元，EUV 设备每台超 2 亿美元。中国是阿斯麦最大市场之一，但受出口限制，阿斯麦被禁止向中国出售 EUV 设备。瑞银指出，考虑到良率和产能差距及监管限制，中国光刻设备不太可能在境外得到应用。阿斯麦发言人对置评请求未作回应。该报道基于瑞银分析师的预测观点，实际进展以产业动态为准。 ","market":"fut","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.chaincatcher.com/article/2286995","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"-1","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["BGIA","EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2658944014","title":"三星电子计划在1nm级制程节点实现High NA EUV商业应用","url":"https://stock-news.laohu8.com/highlight/detail?id=2658944014","media":"格隆汇","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2658944014?lang=zh_cn&edition=fundamental","pubTime":"2026-08-12 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","market":"sh","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.chaincatcher.com/article/2282019","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"1","news_top_title":null,"news_tag":"productRelease","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["BK4588","EUV","BK4585","BK4141","EMXC","NA"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2658611319","title":"SK海力士据报推进EUV工艺 引入新材料PSM","url":"https://stock-news.laohu8.com/highlight/detail?id=2658611319","media":"格隆汇","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2658611319?lang=zh_cn&edition=fundamental","pubTime":"2026-08-11 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EUV技术量产，因财务考量而非技术瓶颈","url":"https://stock-news.laohu8.com/highlight/detail?id=2652459409","media":"IT之家","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2652459409?lang=zh_cn&edition=fundamental","pubTime":"2026-07-17 16:02","pubTimestamp":1784275374,"startTime":"0","endTime":"0","summary":"IT之家 7 月 17 日消息，据 TrendForce 今天报道，英特尔已率先将 High-NA EUV 技术应用于量产 。然而三星这边虽然已经安装了两台 High-NA EUV 设备，却迟迟没有跟进量产。业内人士认为，三星这么做更多是出于财务考量，而非技术瓶颈。据报道，三星去年已在华城园区安装首台 High-NA EUV 设备，并于今年上半年再增设一台，总投资金额预计超 1 万亿韩元 。对于三星来说，目前将 High-NA EUV 设备投入量产，意味着固定运营成本大幅增加。","market":"hk","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://tech.ifeng.com/c/8uprDf1mMVs","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"fenghuang_stock","symbols":["EMXC","BK4585","NA","BK4141","EUV","BK4588"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2651548492","title":"24小时环球政经要闻 | 7月16日","url":"https://stock-news.laohu8.com/highlight/detail?id=2651548492","media":"格隆汇","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2651548492?lang=zh_cn&edition=fundamental","pubTime":"2026-07-16 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13:18","pubTimestamp":1780377480,"startTime":"0","endTime":"0","summary":"韩国产业通商资源部在一份声明中表示，为助力本土蓬勃发展的芯片产业维系竞争力，韩国将简化半导体生产所用极紫外（EUV）光刻机的进口通关手续。根据内阁批准的修订版《高压气体安全控制法》实施细则，EUV 设备进口办理周期将从此前的34天缩短至约9天。韩国产业部表示，此项新政将利好三星电子与 SK 海力士，两家企业可更快完成高端芯片生产设备的装机投产。\n\n\n海量资讯、精准解读，尽在新浪财经APP\n\n责任编辑：王永生","market":"sh","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://finance.sina.com.cn/stock/usstock/c/2026-06-02/doc-inhzyxft1701102.shtml","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"sina","symbols":["EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2640299429","title":"韩国简化极紫外光刻机进口程序，以支持芯片产业发展","url":"https://stock-news.laohu8.com/highlight/detail?id=2640299429","media":"环球市场播报","labels":["policyRegulatory"],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2640299429?lang=zh_cn&edition=fundamental","pubTime":"2026-06-02 13:01","pubTimestamp":1780376519,"startTime":"0","endTime":"0","summary":"韩国产业通商资源部周二表示，政府将简化极紫外光刻（EUV）设备的进口程序。EUV是半导体制造的关键设备，此举旨在帮助韩国蓬勃发展的芯片产业保持其制造竞争力。\n　　根据韩国内阁批准的《高压气体安全管理法》修订实施细则，EUV设备的进口时间预计从目前的34天缩短至约9天。\n　　韩国产业通商资源部表示，此次修订将有助于三星电子和SK海力士等国内芯片制造商快速获得EUV设备，这对于建立先进的生产设施至关重要。\n\n\n海量资讯、精准解读，尽在新浪财经APP\n\n责任编辑：于健 SF069","market":"us","thumbnail":"","type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://finance.sina.com.cn/stock/usstock/c/2026-06-02/doc-inhzyxft1694268.shtml","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"1","news_top_title":null,"news_tag":"policyRegulatory","news_rank":0,"length":0,"strategy_id":0,"source":"sina_us","symbols":["EUV"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2638056175","title":"英特格(ENTG)与JSR 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